Intel’s high NA lithography technology shows early success
Significant progress reported by Intel with its new high numerical aperture (NA) lithography machines from ASML, which are already in production at Intel’s facilities.
Intel has announced that the first two of ASML’s cutting-edge high NA lithography machines are now in operation at its factories. Early data shows these machines are producing more consistent results than previous models, with a reported reliability double that of earlier systems. This marks a turning point for Intel, which had struggled with the earlier generation of extreme ultraviolet (EUV) machines.
Intel’s production of 30,000 wafers in a single quarter using these new machines signifies a substantial step forward in chip manufacturing. These high NA machines can print features onto chips with fewer exposures and less processing time, streamlining the production process and reducing costs. This development is set to contribute to Intel’s upcoming 18A manufacturing technology, expected to power a new generation of PC chips later this year.
The company is also preparing to implement the high NA machines for the next generation of 14A technology, though no mass production date has yet been confirmed. This breakthrough is seen as a pivotal moment for Intel, positioning it to reclaim ground lost to rivals in recent years.
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