Breakthroughs in chip production reported by imec and ASML

Belgium’s imec, a leading semiconductor R&D firm, announced significant breakthroughs in chip-making technology at its joint laboratory with ASML. The advancements were made using ASML’s latest 350 million euro ($382 million) chip printing machine. Imec successfully printed circuitry as small or smaller than the best currently in commercial production, in a single pass under ASML’s new “High NA” tool, suggesting that leading chipmakers can use this tool to create smaller, faster chips in the coming years.

The High NA tool’s ability to print smaller features in fewer steps is expected to save chipmakers money and justify its high price tag. ASML is the largest supplier of lithography systems, crucial for creating chip circuitry. The development indicates that the necessary chemicals and tools for the rest of the chipmaking process are also falling into place for commercial manufacturing. Imec CEO Luc Van den Hove stated that High NA will be instrumental in continuing the scaling of logic and memory technologies.

Intel has purchased the first two High NA tools, with a third expected to go to TSMC later this year. Intel’s director of lithography, Mark Philips, mentioned that a second tool is required for the volume of wafers and experiments needed to support a development line. Other chipmakers, including Samsung Electronics, SK Hynix, and Micron, have also ordered the High NA tool, highlighting its importance in the industry.

These developments come as Micron surpasses revenue expectations in Q3 despite a mixed outlook for Q4, and the US Commerce Department backs SK Hynix with $450 million for an AI plant. These advancements and investments underline the ongoing innovations and growth in the semiconductor sector.